Research objective: fabricate diffractive optics for a tabletop extreme ultraviolet (EUV) lasers - transparent 46.9nm wavelength beam - using contact photolithography and various dry and wet etching methods.

Research primarily took place between three different facilities: micro / nano optics research and education laboratory (MORELab) at MoreHouse College, the EUV Engineering Research Center (ERC) at Colorado State University, and the microelectronics Research Center Cleanroom at Georgia Tech.

INTERFEROMETRIC LITHOGRAPHY WITH AN AMPLITUDE DIVISION INTERFEROMETER AND A DESKTOP EXTREME ULTRAVIOLET LASER

Advisors:
Dr. Willie Rockward & Dr. Mario Marconi